Overview
Daniel M. Fleetwood received his B. S., M. S., and Ph. D. degrees in Physics from Purdue University in 1980, 1981, and 1984. Dan joined Sandia National Laboratories in Albuquerque, New Mexico, in 1984, and was named a Distinguished Member of the Technical Staff in the Radiation Technology and Assurance Department in 1990. In 1999 he left Sandia to accept the position of Professor of Electrical Engineering at Vanderbilt University in Nashville, Tennessee.
In 2000, he was also named a Professor of Physics, in 2001 he was appointed
Associate Dean for Research of the Vanderbilt School of Engineering, and in
2003-2020 he served as Chair of the Electrical
Engineering and Computer Science Department. Dan is the author of more than 600 publications on radiation effects in
microelectronics, 13 of which have been
recognized with Outstanding Paper Awards. These papers have been cited nearly 30,000 times (citation h factor = 92, Google Scholar). A recent review article on
"Radiation Effects in a Post-Moore World" can be found on IEEE Xplore.
In 2009, he received the IEEE Nuclear and Plasma Sciences Society’s Merit
Award, which is the society’s highest individual technical honor. Dan is a
Fellow of the Institute for Electrical and Electronics Engineers, The American
Physical Society, the American Association for
the Advancement of Science, and the National Academy of
Inventors, and a member of ASEE, Phi Beta Kappa, and Sigma Pi Sigma.
Awards
-IEEE NPSS Merit Award – this is the top technical award given by IEEE NPSS, for lifetime achievement, 2009
-Fellow, IEEE (M 87, SM 90, Fellow 1997)
-Fellow of The American Physical Society, November 2001
-Fellow of The American Association for the Advancement of Science, October 2019
-Outstanding (O)/Meritorious (M) Student (S: as co-author) Conference Paper Awards: >30
-Member, Phi Beta Kappa (National Honorary), Sigma Pi Sigma (National Physics Honorary), Phi Kappa Phi (National Honorary)
-Purdue University, College of Science, Distinguished Alumni Award, 2007
-Chancellor’s Research Award, 2002
-Named one of Top 250 most highly cited researchers in Engineering (1981-1999) by Inst. for Scientific Information, 2000
-Discover Magazine (1998), R&D Magazine “R&D 100” (1997) and Industry Week “Technology of Year” (1997) Awards, for co-invention of protonic nonvolatile field effect transistor memory (patent issued 11/3/1998)
-Named Distinguished Member of Technical Staff, Sandia National Laboratories, 1990
Selected Publications
Total-ionizing-dose effects, border traps, and 1/f noise in emerging MOS technologies. Fleetwood DM, IEEE Transactions on Nuclear Science, 67, 1216-1240, (2020) View Abstract
Evolution of total ionizing dose effects in MOS devices with Moore’s Law scaling. Fleetwood DM, IEEE Transactions on Nuclear Science, 65, 1465-1481, (2018) View Abstract
Influence of LDD spacers and H+ transport on the total-ionizing-dose response of 65 nm MOSFETs irradiated to ultrahigh doses. Faccio F, Borghello G, Lerario E, Fleetwood DM, Schrimpf RD, Gong H, Zhang X, Wang P, Michelis S, Gerardin S, Paccagnella A, Bonaldo S, IEEE Transactions on Nuclear Science, 65, 164-174, (2018) View Abstract
Influence of LDD spacers and H+ transport on the total-ionizing-dose response of 65 nm MOSFETs irradiated to ultrahigh doses. Faccio F, Borghello G, Lerario E, Fleetwood DM, Schrimpf RD, Gong H, Zhang X, Wang P, Michelis S, Gerardin S, Paccagnella A, Bonaldo S, IEEE Transactions on Nuclear Science, 65, 164-174, (2018) View Abstract
1/f Noise and Defects in Microelectronic Materials and Devices. Fleetwood DM, IEEE Transactions on Nuclear Science, 62, 1462-1486, (2015) View Abstract
Education
Ph.D., Purdue University, 1984M.S., Purdue University, 1981
B.S., Purdue University, 1980