XeF2 Vapor Etch

The Xactix e2 provides high-selectivity, isotropic xenon difluoride (XeF₂) vapor phase etching of silicon, molybdenum, and germanium for MEMS and other semiconductor processing applications.  The process is dry, plasma-free and fast at room temperature for minimized sample damage.  A transparent quartz lid and integrated inspection microscope allows the user to track etch progress in real time.