Overview
![RIE](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/trion.jpg)
The Trion Phantom II is a reactive ion etch tool for dry etching of dielectrics and semiconductors using fluorine etch chemistry.
![RIE](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/fluorine.jpg)
Capabilities
- Process gases: CF4, CHF3, SF6, O2
- ICP generator: 1250 W @ 13.56 MHz
- RIE generator: 600 W @ 13.56 MHz
- Substrate size: Up to 8 inch (200 mm) diameter
Contact
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VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building