Overview
The Trion Minilock is a load-locked reactive ion etch tool for dry etching of metal films and compound semiconductors using chlorine etch chemistry.
Capabilities
- Process gases:
- Cl2, O2, N2, CF4, Ar
- BCl3 - Upon request
- RF generator: 600 W @ 13.56 MHz
- Substrate size: Up to 8 inch (200 mm) diameter
Contact
-
VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building