Overview
![Resistive Evaporator - Angstrom Amod Resistive Chamber](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/RE-Photo-1.jpg)
The Angstrom Resistive system is currently used to deposit non-precious metals via resistive thermal evaporation. Source materials can be deposited simultaneously in up to three resistive sources with independent rate control and measurement for each source material. The deposition chamber can be opened to air or to a nitrogen glovebox with a spincoater, allowing coatings of air-sensitive samples such as organic films.
Capabilities
![Resistive Evaporator - Angstrom Amod Resistive Chamber](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/RE-Photo-2.png)
- Current deposition materials: Al and Cr
- Additional materials available upon request
- Maximum sample size: 55 inch (14 cm) diameter region (mounted on flat sample holder)
- Sample holder features: rotation for high uniformity films available
- 6 resistive thermal evaporation sources
- Simultaneous operation of up to three resistive sources available
- Film thicknesses controlled by quartz crystal microbalance in conjunction with manual or PID loop control
- Chamber reaches 5e-6 Torr after a 25 minute pumpdown
- Direct access to nitrogen glovebox with spincoater and to multimode deposition system for air-sensitive samples
![Resistive Evaporator - Angstrom Amod Resistive Chamber](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/RE-Photo-3.png)
![Resistive Evaporator - Angstrom Amod Resistive Chamber](http://www.vanderbilt.edu/vinse/wp-content/uploads/sites/40/2024/03/RE-Photo-4.png)
Contact
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VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building