Mask Aligner

Karl Suss MA-6

Overview

Karl Suss

The Karl Suss MA-6 mask aligner is used for high resolution photolithography.  The mask aligner can perform precise alignment of plastic and hard chrome glass masks, both available for fabrication within the VINSE Cleanroom.  Microscope top side alignment and video back side alignment are available for multi-layer photolithography fabrication.  

Capabilities

Karl Suss
A UV exposure in the Karl Suss MA-6 Mask Aligner thorugh a chrome mask to create a photolithographic pattern on a sample in the VINSE Cleanroom. (Owen Meilander, Ebrish Group)
Karl Suss
Metal foil patterned using photolithography lifting off a sample revealing an array of transistors. Fabricated in the VINSE Cleanroom using the Karl Suss MA-6 Mask Aligner and the Angstrom Amod Multimode Deposition Chamber. (Owen Meilander, Ebrish Group)
  • X and Y shift <0.1 um
  • Various sample contact types 
    • Vacuum contact <0.8μm
    • Hard contact <1.5μm
    • Soft contact <2.5μm
    • Proximity <3.0μm
  • Programmable proximity exposure gap of 10-300 µm in 1 µm steps
  • Programmable alignment gap of 1 - 999 µm in 1 µm steps
  • Video Back side alignment to 1 um
  • Top side alignment to 0.5 um
  • Microscope magnification: 5x, 10x, and 20x
  • Sample holder: 3 inch wafer, 4 inch wafer, piece (down to 5 x 5 mm)
    • Samples up to 6 mm thick
  • Light source:
    • 350 W Hg-Arc lamp
    • Suss UV400 Optics (350 - 450 nm)
  • Mask size: 
    • Hard masks - 5 x 5 inch chrome glass masks
    • Plastic masks - must fit onto a 5 x 5 inch glass mask
See All User Fees

Contact

  • VINSE Cleanroom

    VINSE Cleanroom

    Dr. Ben Schmidt, Manager

    Dr. Christina McGahan
    Megan Dernberger

    • 111 Engineering Science Building

Get Access

Vanderbilt User Access
External User Access