Overview
Tanner L-Edit (Software Version 2022.2 Update 1) is a CAD software package primarily used to design lithography direct-write patterns and photomasks. These can be used in conjunction with the Bungard photoplotter, Heidelberg laser writer, and Raith EBL. Complex, multi-layer designs can be achieved with this software package. Licensed versions are available at several computers in the VINSE cleanroom and Pregown areas for user access. An introductory tutorial is available upon request.
Contact
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VINSE Cleanroom
Dr. Ben Schmidt, Manager
Dr. Christina McGahan
Megan Dernberger- 111 Engineering Science Building