We are proud to announce that Vanderbilt University has been awarded $965,000 by the National Science Foundation (NSF) for the acquisition of a 50 kV, high-throughput electron beam lithography (e-beam) tool. This grant, part of the NSF’s Major Research Instrumentation (MRI) program, represents a significant step forward for research, education, and outreach at Vanderbilt.
The project, titled “Equipment: MRI: Track 1 Acquisition of a 50 kV, High-Throughput Electron Beam Lithography Tool for Research, Education, and Outreach at Vanderbilt University,” is led by Josh Caldwell, with co-investigators Richard Mu (Tennessee State University), Sharon Weiss, James McBride, and Justus Ndukaife contributing their expertise.
This advanced e-beam lithography tool will be installed in the Vanderbilt Institute for Nanoscale Science and Engineering (VINSE) cleanroom and enable groundbreaking research across various fields, enhance collaboration between institutions, and provide unparalleled educational opportunities for students. It also demonstrates our commitment to advancing both fundamental science and its applications in technology and innovation.
We extend our gratitude to the NSF for supporting this transformative project and to the incredible team of investigators who made this possible. Stay tuned for updates on the installation and use of this cutting-edge equipment!